Bo-Jou Lu
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 19 March 2012 Paper
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Optical lithography, Etching, Diffusion, Materials processing, Manufacturing, Photomasks, Photoresist processing, Semiconducting wafers, System on a chip

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Optical lithography, Image processing, Manufacturing, Feature extraction, Scanning electron microscopy, Printing, Critical dimension metrology, Imaging arrays, Semiconducting wafers, Design for manufacturability

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Multilayers, Etching, Metals, Reflectivity, Control systems, Line width roughness, Immersion lithography, Logic devices, Back end of line

Proceedings Article | 15 April 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Image processing, Line width roughness, Immersion lithography, Lutetium, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Standards development, 193nm lithography

Proceedings Article | 31 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Electron beam lithography, Polymers, Water, Surface roughness, Surface properties, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Showing 5 of 8 publications
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