Bo-Jou Lu
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 19 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Photoresist processing, Optical lithography, Semiconducting wafers, Diffusion, Manufacturing, System on a chip, Etching, Photomasks, Materials processing

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Image processing, Semiconducting wafers, Scanning electron microscopy, Imaging arrays, Feature extraction, Manufacturing, Optical lithography, Critical dimension metrology, Design for manufacturability, Printing

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Reflectivity, Metals, Line width roughness, Logic devices, Multilayers, Etching, Lithography, Control systems, Immersion lithography, Back end of line

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Line width roughness, Semiconducting wafers, Lithography, Immersion lithography, Standards development, 193nm lithography, Critical dimension metrology, Line edge roughness, Image processing, Lutetium

Proceedings Article | 31 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Electron beam lithography, Photoresist processing, Polymers, Semiconducting wafers, Lithography, Immersion lithography, Water, Surface properties, Surface roughness, Thin film coatings

Showing 5 of 8 publications
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