Bo-Yun Hsueh
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Metrology, Scanners, Error analysis, Control systems, Process control, Immersion lithography, Semiconducting wafers, Environmental sensing, Overlay metrology

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Metrology, Data modeling, Scanners, Error analysis, Process control, Immersion lithography, Semiconducting wafers, Statistical modeling, Overlay metrology

Proceedings Article | 12 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Tunable lasers, Coherence (optics), Imaging systems, Spectroscopy, Laser scanners, Laser stabilization, 3D scanning, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Logic, Optical lithography, Atrial fibrillation, Etching, Image processing, Printing, Photomasks, Double patterning technology, Semiconducting wafers, Resolution enhancement technologies

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