Dr. Bo Mu
at OmniVision Technologies Inc
SPIE Involvement:
Publications (10)

Proceedings Article | 25 September 2010 Paper
Mike Yeh, David Wu, Bo Mu, Bryan Reese
Proceedings Volume 7823, 782338 (2010) https://doi.org/10.1117/12.867258
KEYWORDS: Inspection, Reticles, SRAF, Photomasks, Air contamination, Semiconducting wafers, Contamination, Metals, Defect detection, Wafer inspection

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 76360J (2010) https://doi.org/10.1117/12.847348
KEYWORDS: Reticles, Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet, Defect detection, Line edge roughness, Scanning electron microscopy, Defect inspection, Optical lithography

Proceedings Article | 23 September 2009 Paper
Proceedings Volume 7488, 748807 (2009) https://doi.org/10.1117/12.830668
KEYWORDS: Photomasks, Inspection, Source mask optimization, Semiconducting wafers, Lithography, Manufacturing, Binary data, Reticles, Image processing, Image resolution

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73792B (2009) https://doi.org/10.1117/12.824325
KEYWORDS: Inspection, Reticles, Sensors, Databases, Photomasks, Detection and tracking algorithms, SRAF, Logic, Imaging systems, Critical dimension metrology

Proceedings Article | 24 March 2009 Paper
Proceedings Volume 7272, 72723O (2009) https://doi.org/10.1117/12.815574
KEYWORDS: Prototyping, Inspection, Reticles, Sensors, Detection and tracking algorithms, Imaging systems, Logic, SRAF, Signal to noise ratio, Digital breast tomosynthesis

Showing 5 of 10 publications
Conference Committee Involvement (3)
Digital Photography and Mobile Imaging XI
9 February 2015 | San Francisco, California, United States
Digital Photography X
3 February 2014 | San Francisco, California, United States
Digital Photography IX
4 February 2013 | Burlingame, California, United States
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