Dr. Boaz Brill
CEO at GluSense Ltd
SPIE Involvement:
Author
Publications (9)

SPIE Journal Paper | October 1, 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Metrology, Scatterometry, Critical dimension metrology, Semiconducting wafers, Data modeling, Atomic force microscopy, Transmission electron microscopy, Inspection, 3D metrology

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Metrology, Data modeling, Polarization, Etching, Metals, Scatterometry, Semiconducting wafers, Optics manufacturing, Channel projecting optics

PROCEEDINGS ARTICLE | March 29, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Metrology, Data modeling, Metals, Inspection, Atomic force microscopy, Transmission electron microscopy, Scatterometry, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Oxides, Diffraction, Scattering, Spectroscopy, Amplifiers, Reflectometry, Rayleigh scattering, Field spectroscopy, Reflectance spectroscopy, Line edge roughness

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Wafer-level optics, Metrology, Optical properties, Etching, Metals, Silicon, Scatterometry, Critical dimension metrology, Semiconducting wafers, Material characterization

PROCEEDINGS ARTICLE | July 16, 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Lithography, Diffraction, Metrology, Data modeling, Scatterometry, Process control, Finite element methods, Neural networks, Cadmium sulfide, Semiconducting wafers

Showing 5 of 9 publications
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