Dr. Bob Gleason
General Manager at
SPIE Involvement:
Conference Program Committee | Author
Publications (29)

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Metrology, Scanners, Inspection, Image resolution, Photomasks, Source mask optimization, SRAF, Semiconducting wafers, Inverse optics, Fiber optic illuminators

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Carbon, Refractive index, Multilayers, Contamination, Calibration, Electroluminescence, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Double positive medium

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Etching, Metals, Manufacturing, Photomasks, Double patterning technology, Immersion lithography, Source mask optimization, SRAF, Fiber optic illuminators

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Logic, Detection and tracking algorithms, Image segmentation, Photomasks, Source mask optimization, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Metals, Image segmentation, Photomasks, Double patterning technology, Source mask optimization, Computational lithography, Mask making, Back end of line, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Opacity, Photomasks, Source mask optimization, Performance modeling, Phase shifts, Current controlled current source

Showing 5 of 29 publications
Conference Committee Involvement (1)
Photomask Technology
1 October 2002 | Monterey, CA, United States
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