Bob Lofgren
at Univ of Illinois
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Etching, Ions, Silicon, Hydrogen, Extreme ultraviolet, Extreme ultraviolet lithography, Temperature metrology, Plasma, Tin

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Chemical species, Sputter deposition, Particles, Electrons, Ions, Photomasks, Helium, Semiconducting wafers, Plasma

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