Mr. Bob Streefkerk Profile

Bob Streefkerk

metrology system function architect at ASML Netherlands BV

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 19 March 2007 Paper

Defects, overlay, and focus performance improvements with five generations of immersion exposure systems

Jan Mulkens, Bob Streefkerk, Hans Jasper, Jos de Klerk, Fred de Jong, Leon Levasier, Martijn Leenders

Proceedings Volume 6520, 652005 (2007) https://doi.org/10.1117/12.713577

KEYWORDS: Semiconducting wafers, Particles, Signal attenuation, Scanners, Bridges, Thin film coatings, Molecular bridges, Photoresist processing, Control systems, Curtains

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Proceedings Article | 20 March 2006 Paper

Immersion specific defect mechanisms: findings and recommendations for their control

Michael Kocsis, Dieter Van Den Heuvel, Roel Gronheid, Mireille Maenhoudt, Dizana Vangoidsenhoven, Greg Wells, Nickolay Stepanenko, Michael Benndorf, Hyun Woo Kim, Shinji Kishimura, Monique Ercken, Frieda Van Roey, S. O'Brien, Wim Fyen, Philippe Foubert, Richard Moerman, Bob Streefkerk

Proceedings Volume 6154, 615409 (2006) https://doi.org/10.1117/12.660432

KEYWORDS: Semiconducting wafers, Thin film coatings, Water, Particles, Scanners, Immersion lithography, Manufacturing, Scanning electron microscopy, Space operations, Distortion

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Proceedings Article | 15 March 2006 Paper

A dive into clear water: immersion defect capabilities

B. Streefkerk, J. Mulkens, R. Moerman, M. Stavenga, J. van der Hoeven, C. Grouwstra, R. Bruls, M. Leenders, S. Wang, Y. van Dommelen, M. Boerema, H. Jansen, K. Cummings, M. Riepen, H. Boom, M. Suddendorf, P. Huisman

Proceedings Volume 6154, 61540S (2006) https://doi.org/10.1117/12.660376

KEYWORDS: Particles, Thin film coatings, Semiconducting wafers, Scanners, Curtains, Photoresist processing, Scanning electron microscopy, Immersion lithography, Lithography, Manufacturing

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Proceedings Article | 15 March 2006 Paper

The next phase for immersion lithography

Harry Sewell, Jan Mulkens, Diane McCafferty, Louis Markoya, Bob Streefkerk, Paul Graeupner

Proceedings Volume 6154, 615406 (2006) https://doi.org/10.1117/12.657574

KEYWORDS: Semiconducting wafers, Neodymium, Refractive index, Water, Immersion lithography, Microfluidics, Optical lithography, Critical dimension metrology, Absorption, Glasses

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Proceedings Article | 12 May 2005 Paper

Immersion lithography exposure systems: today's capabilities and tomorrow’s expectations

Jan Mulkens, Bob Streefkerk, Martin Hoogendorp, Richard Moerman, Martijn Leenders, Fred de Jong, Marco Stavenga, Herman Boom

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.606799

KEYWORDS: Semiconducting wafers, Immersion lithography, Lenses, Lithography, Manufacturing, Water, SRAF, Overlay metrology, Distortion, Lens design

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Proceedings Article | 27 January 2005 Paper

ArF immersion lithography using TWINSCAN technology

Jan Mulkens, Bob Streefkerk, Martin Hoogendorp

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.578071

KEYWORDS: Semiconducting wafers, Imaging systems, Immersion lithography, Optical alignment, Lithography, Water, Sensors, Metals, Prototyping, Optical lithography

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Proceedings Article | 28 May 2004 Paper

Extending optical lithography with immersion

Bob Streefkerk, Jan Baselmans, Wendy Gehoel-van Ansem, Jan Mulkens, Chris Hoogendam, Martin Hoogendorp, Donis Flagello, Harry Sewell, Paul Graupner

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534009

KEYWORDS: Semiconducting wafers, Immersion lithography, Prototyping, Microfluidics, Optical lithography, Wafer-level optics, Image sensors, Imaging systems, Lithography, Scanners

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SPIE Journal Paper | 1 January 2004

Benefits and limitations of immersion lithography

Jan Mulkens, Donis Flagello, Bob Streefkerk, Paul Gräupner

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1636768

KEYWORDS: Photoresist materials, Semiconducting wafers, Water, Liquids, Polarization, Immersion lithography, Lithography, Fluid dynamics, Microfluidics, Refractive index

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Proceedings Article | 5 July 2000 Paper

Issues and nonissues on a 193-nm step-and-scan system in production

Jeff Schefske, Eric Kent, Uzodinma Okoroanyanwu, Harry Levinson, Charles Masud, Bob Streefkerk, Ralph Hanzen, Joerg Brueback

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389035

KEYWORDS: 193nm lithography, Stray light, Semiconducting wafers, Chlorine, Reliability, Lithography, Optical components, Pulsed laser operation, Reticles, Sensors

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Proceedings Article | 29 June 1998 Paper

CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-um gate printing

Kurt Ronse, Mireille Maenhoudt, Thomas Marschner, Luc Van den hove, Bob Streefkerk, Jo Finders, Jan van Schoot, Paul Luehrmann, Anna Maria Minvielle

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310789

KEYWORDS: Critical dimension metrology, Scanners, Reticles, Semiconducting wafers, Control systems, Lithography, Deep ultraviolet, Scanning electron microscopy, Manufacturing, Ions

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Proceedings Article | 29 June 1998 Paper

Lithographic performance of recent DUV photoresists

Bob Streefkerk, Koen van Ingen Schenau, Corine Buijk

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312369

KEYWORDS: Photoresist materials, Semiconducting wafers, Chlorine, Electroluminescence, Critical dimension metrology, Deep ultraviolet, Reticles, Thin film coatings, Scanning electron microscopy, Silicon

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Showing 5 of 11 publications

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