Bobae Kim
at Hanyang Univ
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Semiconductors, Lithography, Etching, Polymers, Photoresist materials, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Chemically amplified resists

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