Bobby Moore
at Nikon Precision Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Monochromatic aberrations, Reticles, Metrology, Optical lithography, Wavefronts, Distortion, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Overlay metrology

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Monochromatic aberrations, Optical lithography, Cadmium, Error analysis, Wavefronts, Wavefront aberrations, Zernike polynomials, Critical dimension metrology, Optimization (mathematics), Spherical lenses

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