Bobby Moore
at Nikon Precision Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Distortion, Optimization (mathematics), Semiconducting wafers, Critical dimension metrology, Reticles, Monochromatic aberrations, Overlay metrology, Wavefronts, Optical lithography, Metrology

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Monochromatic aberrations, Spherical lenses, Optical lithography, Optimization (mathematics), Wavefronts, Critical dimension metrology, Zernike polynomials, Error analysis, Wavefront aberrations, Cadmium

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