Boo-Hyun Ham
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 22 February 2021 Presentation
Yaniv Abramovitz, Boo-Hyun Ham, Sangho Jo, Byoung-Hoon Kim, Jongsu Kim, Insung Kim, Kevin Houchens, Noam Shaham, Jeong Ho_Yeo, PavanKumar Mannava
Proceedings Volume 11611, 116111Z (2021) https://doi.org/10.1117/12.2585369
KEYWORDS: Image enhancement, Overlay metrology, Metrology, Hassium, Scanning electron microscopy, Process control, Optical lithography, Measurement devices, Inspection, Electron beam lithography

Proceedings Article | 28 March 2017 Presentation + Paper
Boo-Hyun Ham, Il-Hwan Kim, Sung-Sik Park, Sun-Young Yeo, Sang-Jin Kim, Dong-Woon Park, Joon-Soo Park, Chang-Hoon Ryu, Bo-Kyeong Son, Kyung-Bae Hwang, Jae-Min Shin, Jangho Shin, Ki-Yeop Park, Sean Park, Lei Liu, Ming-Chun Tien, Angelique Nachtwein, Marinus Jochemsen, Philip Yan, Vincent Hu, Christopher Jones
Proceedings Volume 10145, 101451P (2017) https://doi.org/10.1117/12.2257964
KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Metrology, Scanning electron microscopy, Critical dimension metrology, Electron beam lithography, Metals, Defect detection, Scanners

Proceedings Article | 6 April 2012 Paper
Jie Li, Asher Tan, JinWoo Jung, Gary Goelzer, Nigel Smith, Jiangtao Hu, Boo-Hyun Ham, Min-Cheol Kwak, Cheol-Hong Kim, Suk-Woo Nam
Proceedings Volume 8324, 83243A (2012) https://doi.org/10.1117/12.918706
KEYWORDS: Semiconducting wafers, Overlay metrology, Detection and tracking algorithms, Wafer testing, Wafer-level optics, Reflectivity, Oxides, Error analysis, Silicon, Precision measurement

Proceedings Article | 4 April 2012 Paper
Boo-Hyun Ham, Sangho Yun, Min-Cheol Kwak, Soon Mok Ha, Cheol-Hong Kim, Suk-Woo Nam
Proceedings Volume 8324, 83240A (2012) https://doi.org/10.1117/12.918002
KEYWORDS: Overlay metrology, Semiconducting wafers, Scanners, Data modeling, Metrology, Error analysis, Front end of line, Back end of line, Photomasks, Nondestructive evaluation

Proceedings Article | 2 April 2010 Paper
Boo-Hyun Ham, Hyun-Jea Kang, Chan Hwang, Jeong-Ho Yeo, Cheol-Hong Kim, Suk-Woo Nam, Joo-Tae Moon, Martyn Coogans, Arie den Boef, Chan-Ho Ryu, Stephen Morgan, Andreas Fuchs
Proceedings Volume 7638, 76381S (2010) https://doi.org/10.1117/12.848399
KEYWORDS: Overlay metrology, Semiconducting wafers, Diffraction, Diffraction gratings, Metrology, Oxides, Scatterometry, Lithography, Image processing, Photoresist processing

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