Boo-Hyun Ham
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Electron beam lithography, Metrology, Optical lithography, Inspection, Scanning electron microscopy, Process control, Measurement devices, Image enhancement, Overlay metrology, Hassium

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Electron beam lithography, Metrology, Defect detection, Metals, Scanners, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 6 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Wafer-level optics, Oxides, Detection and tracking algorithms, Error analysis, Silicon, Reflectivity, Precision measurement, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 4 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Scanners, Error analysis, Nondestructive evaluation, Photomasks, Semiconducting wafers, Overlay metrology, Back end of line, Front end of line

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Oxides, Lithography, Diffraction, Metrology, Image processing, Scatterometry, Photoresist processing, Semiconducting wafers, Overlay metrology, Diffraction gratings

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top