Booky Lee
Section Manager at Toppan Chunghwa Electronics Co Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Wafer-level optics, Lithography, Scanners, Manufacturing, Microelectronics, Photomasks, Lutetium, Critical dimension metrology, Semiconducting wafers, 193nm lithography

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Polishing, Quartz, Chromium, Printing, Microelectronics, Photomasks, Lutetium, Semiconducting wafers, 193nm lithography

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Diffractive optical elements, Etching, Quartz, Image processing, Chromium, Photomasks, Neodymium, Binary data, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Semiconductors, Lithography, Calibration, Image processing, Manufacturing, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electronics, Etching, Manufacturing, Photomasks, Critical dimension metrology, Line edge roughness, Photoresist processing, Edge roughness, Tin, Chemically amplified resists

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Data modeling, Etching, Quartz, Coating, Manufacturing, Chromium, Photomasks, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 8 publications
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