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Boren Luo
at Taiwan Semiconductor Manufacturing Co Ltd
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Publications (1)
Proceedings Article | 7 March 2008 Paper
Pellicle effect on OPC modeling
H. Lin, Timothy Wu, W. Huang, Y. Ku, C. Lai, R. Liu, W. Wang, Chi-Kang Chang, Boren Luo, K. Chen
Proceedings Volume 6924, 69243T (2008) https://doi.org/10.1117/12.775419
KEYWORDS: Diffraction, Data modeling, Polarization, Signal attenuation, Pellicles, Projection systems, Photomasks, Immersion lithography, Optical proximity correction, Critical dimension metrology
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