Dr. Boris Kobrin
Chief Technology Officer at Metamaterial Technologies Inc
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 7, 2014
Proc. SPIE. 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII
KEYWORDS: Lithography, Nanostructures, Antireflective coatings, Optical lithography, Glasses, Ultraviolet radiation, Reflectivity, Refraction, Photomasks, Cones

PROCEEDINGS ARTICLE | February 8, 2012
Proc. SPIE. 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
KEYWORDS: Lithography, Nanostructures, Optical lithography, Nanostructuring, Glasses, Ultraviolet radiation, Printing, Near field, Photomasks, Nanolithography

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Silicon, Coating, Process control, Deposition processes, Nanoimprint lithography, Photoresist processing, Self-assembled monolayers, Plasma, Liquids

PROCEEDINGS ARTICLE | January 22, 2005
Proc. SPIE. 5716, Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS IV
KEYWORDS: Microelectromechanical systems, Polymers, Glasses, Silicon, Manufacturing, Reliability, Optical coatings, Self-assembled monolayers, Plastic coatings, Liquids

PROCEEDINGS ARTICLE | December 30, 2003
Proc. SPIE. 5342, Micromachining and Microfabrication Process Technology IX
KEYWORDS: Microelectromechanical systems, Coating, Reliability, Process control, Deposition processes, Semiconducting wafers, Self-assembled monolayers, Plasma treatment, Plasma, Liquids

PROCEEDINGS ARTICLE | June 29, 1998
Proc. SPIE. 3333, Advances in Resist Technology and Processing XV
KEYWORDS: Metals, Glasses, Ultraviolet radiation, Laser energy, Manufacturing, Photoresist materials, Photomasks, Chemical elements, Photoresist processing, Floods

Showing 5 of 8 publications
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