Dr. Boris Menchtchikov
at ASML San Jose
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Metrology, Logic, Sensors, Scanners, Distortion, Process control, Optical alignment, Semiconducting wafers, Overlay metrology, Lithographic process control

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Polarization, Sensors, Etching, Scanners, Monte Carlo methods, Optical alignment, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 30 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Avalanche photodetectors, Optical lithography, Sensors, Scanners, Signal processing, Far infrared, Optical alignment, Semiconducting wafers, Signal detection, Overlay metrology

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Avalanche photodetectors, Optical lithography, Etching, Scanners, Silicon, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Actuators, Lithography, Reticles, Metrology, Calibration, Scanners, Control systems, Photomasks, Semiconducting wafers, Overlay metrology

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top