Dr. Bosheng Zhang
Research Scientist at KLA-Tencor Corp
SPIE Involvement:
Author
Area of Expertise:
EUV/X-ray , laser(DPSS, femtosecond) , optics , imaging/microscopy , nano-fabrication , programming(LabVIEW/C++/MatLab/Python)
Profile Summary

• Ph.D. (expected in Jan 2015) in Physics, specialized in innovative tabletop coherent EUV/X-ray imaging, for fast, widefield and high resolution (down to 22 nm) nano-imaging applications including metrology/defect
• Demonstrated achievement with 9 publications and 1 pending patent; Spearheaded the full life cycle of challenging projects, including strategic planning, modeling/simulating, designing, hardware purchasing & machining, system constructing, data acquisition & processing software development, and reporting
• 6 years’ hands-on lab experience of designing/constructing complex optical/imaging systems, and operating various lasers (DPSS/femtosecond); Familiar with opto-mechanics, eletro-optics, polarization, stages, detectors
• Proficient in using/testing/programming CMOS/CCD sensors; Experienced in building a modular EUV/X-ray camera; Hobbyist of commercial DSLR and Kinect 3D motion sensing cameras
• Proficient in optical system modeling & beam propagation simulation; Knowledge of ZEMAX modeling/design
• Experienced in lithography (photo- or e-beam) and other clean room fabrication; Other hardware skills: machining, electronics, gas/vacuum, temperature control, analytical instruments (SEM/AFM, optical microscope, XRD, ellipsometer/profilometer/interferometer), laser characterization (spectrum, mode, wavefront, pointing stability)
• Solid knowledge of general physics/optics, lasers, nonlinear optics, spectroscopy, diffraction/scatterometry
• Proficient in test/data acquisition automating, UI design with LabVIEW and procedure development
• 5 years’ image processing (filtering, remapping, masking, HDR combining) & data analysis experience with C++/MatLab/Python, and high performance computing/large data sets processing with parallel/GPU computing
• Collaborated with Intel and Samsung to promote technology transfer of laboratory diffractive nano-imaging for industry metrology/defect inspection applications; Familiar with semiconductor industry
Publications (6)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Lithography, Inspection, 3D modeling, Scanning electron microscopy, Photoresist materials, Near field, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | April 21, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Coherence imaging, Microscopy, Photons, X-rays, Silicon, Reflectivity, Multiplexing, Phase imaging, Process control, Extreme ultraviolet, Coherent x-ray sources, Defect inspection

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Microscopes, Coherence imaging, Mirrors, X-rays, Inspection, Image resolution, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | September 26, 2013
Proc. SPIE. 8851, X-Ray Nanoimaging: Instruments and Methods
KEYWORDS: Microscopes, Diffraction, Coherence imaging, Mirrors, Sensors, Light scattering, Image restoration, Image resolution, Phase retrieval, Extreme ultraviolet

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Microscopes, Diffraction, Coherence imaging, Mirrors, Imaging systems, Image resolution, Photomasks, Extreme ultraviolet, Charge-coupled devices, Zone plates

PROCEEDINGS ARTICLE | April 3, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Microscopes, Diffraction, Coherence imaging, Imaging systems, Image processing, Light scattering, Image resolution, Phase retrieval, Extreme ultraviolet, Spatial resolution

Showing 5 of 6 publications
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