Mr. Boxiu Spike Cai
at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Laser sources, Safety, Image processing, Frequency modulation, Photomasks, Fermium, Semiconductor manufacturing, Critical dimension metrology, Chlorine, Semiconducting wafers

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Metrology, Statistical analysis, Data modeling, Error analysis, Manufacturing, Process control, Critical dimension metrology, Semiconducting wafers, Signal detection, Americium

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Metrology, Image acquisition, Physics, Control systems, Scanning electron microscopy, Time metrology, Critical dimension metrology, Line edge roughness, Semiconducting wafers

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