Brad H. Reelfs
Director at Drytek Distribution LLC
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Etching, Dry etching, Chromium, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Reactive ion etching, Binary data

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Diffractive optical elements, Etching, Dry etching, Chromium, Photomasks, Reactive ion etching, Neodymium, Binary data, Standards development, Plasma

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Diffractive optical elements, Etching, Quartz, Dry etching, Image processing, Surface roughness, Chromium, Scanning electron microscopy, Photomasks, Phase shifts

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