Dr. Bradley Morgenfeld
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 23 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Wafer-level optics, Lithography, Diffraction, Metrology, Scanners, Process control, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Yield improvement

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Calibration, Error analysis, Diffusion, 3D modeling, SRAF, Photoresist processing, Semiconducting wafers, Performance modeling, Process modeling, Photo decomposable quencher

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Etching, Line edge roughness, Photoresist processing, 193nm lithography

Proceedings Article | 19 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Optical lithography, Etching, Electroluminescence, Photomasks, Extreme ultraviolet, Double patterning technology, Source mask optimization, Optical proximity correction, SRAF

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Semiconductors, Optical lithography, Etching, Metals, Scanning electron microscopy, Atomic layer deposition, Photomasks, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Back end of line

Showing 5 of 15 publications
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