Dr. Bradley Morgenfeld
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Publications (13)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Etching, Line edge roughness, Photoresist processing, 193nm lithography

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Optical lithography, Etching, Electroluminescence, Photomasks, Extreme ultraviolet, Double patterning technology, Source mask optimization, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Semiconductors, Optical lithography, Etching, Metals, Scanning electron microscopy, Atomic layer deposition, Photomasks, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Back end of line

SPIE Journal Paper | May 2, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Overlay metrology, Distortion, Scanners, Reticles, Image processing, Semiconducting wafers, Error analysis, Optical alignment, Photomasks, Calibration

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Oxides, Thin films, Lithography, Metrology, Optical lithography, Data modeling, Silicon, Distortion, Silicon films, Process control, Error control coding, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Reticles, Optical lithography, Lithographic illumination, Scanners, Error analysis, Distortion, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 13 publications
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