Dr. Brandon L. Ward
Member of Technical Staff at Lam Research Corp
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Etching, Photomasks, Extreme ultraviolet, Plasma enhanced chemical vapor deposition, Plasma etching, Extreme ultraviolet lithography, High volume manufacturing, Reactive ion etching, Stochastic processes, Focus stacking software

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Aberration correction, Manufacturing, Scanning electron microscopy, Printing, Bridges, Optical proximity correction, Algorithm development, Semiconducting wafers, Illumination engineering, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 11, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Spatial frequencies, Etching, Image processing, Photoresist materials, Smoothing, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Edge detection, Metrology, Environmental monitoring, Modulation, Silicon, Scanning electron microscopy, Objectives, Semiconductor manufacturing, Optical alignment, Local area networks

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