Dr. Brian Cline
at ARM Inc
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical lithography, Nano opto mechanical systems, Error analysis, Computer simulations, Photomasks, Shape analysis, Directed self assembly, Double patterning technology, Optical proximity correction

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Metals, Legal, Optical tracking, Design for manufacturing, Photomasks, Double patterning technology, Computational lithography, Standards development, 193nm lithography, Design for manufacturability

SPIE Journal Paper | February 3, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Lithography, Optical lithography, Photomasks, Standards development, Legal, Manufacturing, Logic, Electrochemical etching, Double patterning technology, Algorithms

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Logic, Optical lithography, Manufacturing, Legal, Photomasks, Double patterning technology, Standards development, 193nm lithography, Design for manufacturability

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Lithography, Optical lithography, Clocks, Etching, Metals, Image processing, Manufacturing, Image quality, Photomasks, Double patterning technology

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top