Dr. Brian Cline
at ARM Inc
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Directed self assembly, Error analysis, Nano opto mechanical systems, Computer simulations, Optical proximity correction, Lithography, Double patterning technology, Optical lithography, Photomasks, Shape analysis

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Design for manufacturability, Computational lithography, Optical tracking, Standards development, Metals, Design for manufacturing, Photomasks, 193nm lithography, Legal, Double patterning technology

SPIE Journal Paper | February 3, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Lithography, Optical lithography, Photomasks, Standards development, Legal, Manufacturing, Logic, Electrochemical etching, Double patterning technology, Algorithms

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Optical lithography, Standards development, 193nm lithography, Photomasks, Lithography, Double patterning technology, Legal, Logic, Design for manufacturability, Manufacturing

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Photomasks, Optical lithography, Metals, Double patterning technology, Etching, Image processing, Manufacturing, Lithography, Clocks, Image quality

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