Brian W. Dillon
SPIE Involvement:
Publications (11)

Proceedings Article | 23 August 2021 Paper
Mohamed Ramadan, Brian Dillon, Michael Green, Chris Progler, Young Ham, Ahmad Syukri
Proceedings Volume 11908, 1190804 (2021)
KEYWORDS: Process modeling, Photomasks, Extreme ultraviolet, Model-based design, Extreme ultraviolet lithography, Deep ultraviolet, Photoresist processing, Modeling, Logic, Lithography

Proceedings Article | 20 September 2020 Presentation
Dai Tsunoda, Yasuaki Horima, Yohei Torigoe, Brian Dillon, Adam Lyons, Tom Wallow, Kurt Wampler, Vincent Shu, Quan Zhang
Proceedings Volume 11518, 115180P (2020)
KEYWORDS: Photomasks, Optical proximity correction, Lithography, Device simulation, Semiconducting wafers, Optical simulations

Proceedings Article | 20 October 2016 Paper
Proceedings Volume 10032, 1003205 (2016)
KEYWORDS: Photomasks, Manufacturing, Optical proximity correction, SRAF, Inspection, Metals, Optics manufacturing, Scanning electron microscopy, Logic, Lithography

Proceedings Article | 4 October 2016 Paper
Proceedings Volume 9985, 99851A (2016)
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Modulation, Beam shaping, Metals, SRAF, Control systems, Source mask optimization

Proceedings Article | 26 September 2016 Paper
Proceedings Volume 9985, 99850R (2016)
KEYWORDS: Photomasks, SRAF, Optical proximity correction, Logic, Manufacturing, Metals, Inspection, Image processing, Information operations, Scanning electron microscopy

Showing 5 of 11 publications
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