Brian W. Dillon
Senior Engineer at
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | October 20, 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Lithography, Logic, Metals, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Optics manufacturing

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photovoltaics, Modulation, Metals, Control systems, Photomasks, Beam shaping, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers

PROCEEDINGS ARTICLE | September 26, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Logic, Metals, Image processing, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Information operations

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Metrology, Data modeling, Calibration, Data processing, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Photoresist processing, Process modeling

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Scanning electron microscopy, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Reticles, Optical lithography, Visualization, Inspection, Photomasks, Cadmium sulfide, Optical proximity correction, Critical dimension metrology, Vestigial sideband modulation

Showing 5 of 9 publications
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