Brian W. Dillon
Senior Engineer
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 20 October 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Lithography, Logic, Metals, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Optics manufacturing

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photovoltaics, Modulation, Metals, Control systems, Photomasks, Beam shaping, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 26 September 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Logic, Metals, Image processing, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Information operations

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Metrology, Data modeling, Calibration, Data processing, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Photoresist processing, Process modeling

Proceedings Article | 3 April 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Scanning electron microscopy, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers, Fiber optic illuminators

Showing 5 of 9 publications
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