Mr. Brian J. Grenon
President of Grenon Consulting at
SPIE Involvement:
Scholarship Committee | Symposia Committee | Fellow status | Conference Program Committee | Symposium Committee | Conference Chair | Symposium Chair | Author | Instructor
Publications (40)

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Reticles, FT-IR spectroscopy, Contamination, Air contamination, Ions, Pellicles, Photomasks, Fluorine, Semiconducting wafers, Adhesives

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Reticles, Air contamination, Particles, Ions, Chromium, Photomasks, Extreme ultraviolet, Binary data, Mask cleaning, 193nm lithography

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Reticles, Contamination, Quartz, Air contamination, Particles, Ions, Inspection, Pellicles, Humidity, Photomasks

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Semiconductors, Lithography, Etching, Dry etching, Manufacturing, Inspection, Inspection equipment, Photomasks, Beam propagation method, Instrument modeling

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Reticles, Magnesium, Contamination, Quartz, Air contamination, Crystals, Inspection, Photomasks, Semiconducting wafers, Crystallography

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Reticles, Contamination, Air contamination, Scanners, Nitrogen, Chemistry, Manufacturing, Inspection, Humidity, Photomasks

Showing 5 of 40 publications
Conference Committee Involvement (31)
Photomask Technology
17 September 2018 | Monterey, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Photomask Technology
11 September 2012 | Monterey, California, United States
Photomask Technology
19 September 2011 | Monterey, California, United States
Showing 5 of 31 published special sections
Course Instructor
SC988: Identifying and Controlling Micro-contamination in Critical Environments
This course will provide an in-depth view of sources and types of micro-contamination on all optical surfaces, including, lenses, mirrors, beam splitters and photomasks. It will help provide a better understanding of critical practices in the optics and photomask industries. Challenges in contamination control for new lithography approaches such as Nano-Imprint Lithography (NIL) and Extreme Ultra-Violet (EUV) will be addressed. Additionally, we will present principles for proper material selection in manufacturing contamination-free optical elements. Analytical techniques used to determine types of contamination will also be discussed.
SC854: Nanoscale Photomask Metrology - Theory and Practice
This course provides attendees with a basic working knowledge of the principles of metrology, with emphasis on measuring the size or placement of features on IC wafers and photomasks. The course covers the metrology concepts defined by ISO (the International Organization for Standardization) and used by national metrology laboratories around the world, and shows how to reduce these concepts to practice in a research or manufacturing environment. Practical examples will be given.
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