A growing need for low stress high temperature thick film materials has prompted the development of new spin-coatable photopatternable silicones (Dow Corning WL-5000 series) to assist manufactures in building the next generation of electronic devices. These new negative-tone materials can be easily coated onto electronic substrates and patterned using standard i-line and broadband lithographic processes. Films ranging from 6 to 50 μm have been demonstrated with patterned features resolved to an aspect ratio of less than 1.3. The etched regions provide a sloped sidewall and curved surfaces to facilitate metallization processes. The films are cured at low temperatures (150 to 250°C) to provide low modulus values in the range of 150 to 500 MPa, are inherently hydrophobic, and are based on cure chemistry that is acid free and delivers thermally stable cross-links. As a result, the films show very little shrinkage during thermal cure (~2%), do not require extended high temperature processing, and provide a very low residual stress (<8 MPa). They also show excellent thermal stability and mechanical integrity when exposed to high temperatures. A simple wet process has been developed to facilitate film rework and allow for sacrificial layer applications.