Mr. Brian Hoang
at Donaldson Co Inc
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Semiconductors, Carbon, Lithography, Optical lithography, Contamination, Silicon, Gases, Chemistry

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Carbon, FT-IR spectroscopy, Statistical analysis, Ions, Hydrogen, Humidity, Adsorption, Natural surfaces, Ion exchange

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Carbon, Lithography, Contamination, Fluctuations and noise, Sensors, Ions, Gases, Humidity, Network architectures, Industrial chemicals

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Oxides, Carbon, Ions, Gases, Sulfur, Nitrogen, Manufacturing, Adsorption, Chemical analysis, Industrial chemicals

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Optical filters, Contamination, Sensors, Sulfur, Manufacturing, Directed energy weapons, Humidity, Adsorption, Semiconducting wafers

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