Brian Chi-Chuang Lee
Team Member at Taiwan Semiconductor Mfg Co
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Metrology, Optical lithography, Data modeling, Calibration, Scanners, Interfaces, Inspection, Photoresist materials, Process control, Finite element methods, Semiconducting wafers

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Image compression, Video, Error analysis, Image resolution, Scanning electron microscopy, Video compression, Semiconductor manufacturing, Semiconducting wafers, Prototyping, RGB color model

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Wafer-level optics, Metrology, Cadmium, Inspection, Optical testing, Scanning electron microscopy, Finite element methods, Critical dimension metrology, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Optical lithography, Manufacturing, Optics manufacturing

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