Dr. Brian Osborn
QC Manager at JSR Micro Inc
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 19 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Silicon, Reflectivity, Chromophores, Silicon films, Solids, Critical dimension metrology, Semiconducting wafers, Bottom antireflective coatings

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Etching, Dielectrics, Scanning electron microscopy, Photomasks, Double patterning technology, Reactive ion etching, Photoresist processing

Proceedings Article | 26 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Semiconductors, Lithography, Particles, Silicon, Scanning electron microscopy, Photomasks, Double patterning technology, Reactive ion etching, Photoresist processing, Semiconducting wafers

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Optical lithography, Metals, Silicon, Photoresist materials, Chemical analysis, Photoresist processing, Semiconducting wafers, Wafer testing, Back end of line

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Optical lithography, Etching, Silicon, Reflectivity, Scanning electron microscopy, Photoresist materials, Photomasks, Line edge roughness, Photoresist developing

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Transparency, Optical lithography, Polymers, Glasses, Scanning electron microscopy, Photoresist materials, Absorbance, Semiconducting wafers, Distributed interactive simulations, Picture Archiving and Communication System

Showing 5 of 14 publications
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