Dr. Brian M. Trafas
Vice President Marketing at KLA Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 5 May 2005 Paper
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Metrology, Data modeling, Process control, Design for manufacturing, Line width roughness, Immersion lithography, Critical dimension metrology, Overlay metrology, Single crystal X-ray diffraction

Proceedings Article | 7 July 1997 Paper
Proc. SPIE. 3050, Metrology, Inspection, and Process Control for Microlithography XI
KEYWORDS: Contamination, Optical spheres, Metals, Silicon, Manufacturing, Reliability, Inspection, Wafer inspection, Semiconductor manufacturing, Semiconducting wafers

Proceedings Article | 22 September 1995 Paper
Proc. SPIE. 2635, Microelectronic Manufacturing Yield, Reliability, and Failure Analysis
KEYWORDS: Optical spheres, Defect detection, Metals, Image processing, Reliability, Inspection, Wafer inspection, Semiconducting wafers, Prototyping, Laser systems engineering

Proceedings Article | 18 September 1995 Paper
Proc. SPIE. 2638, Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II
KEYWORDS: Polarization, Scattering, Particles, Silicon, Light scattering, Inspection, Laser scanners, Wafer inspection, Semiconducting wafers, Dielectric polarization

Proceedings Article | 22 May 1995 Paper
Proc. SPIE. 2439, Integrated Circuit Metrology, Inspection, and Process Control IX
KEYWORDS: Wafer-level optics, Scattering, Particles, Light scattering, Inspection, Laser scanners, Wafer inspection, Semiconducting wafers, Signal detection, Laser systems engineering

Conference Committee Involvement (4)
Metrology, Inspection, and Process Control for Microlithography XXII
25 February 2008 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXI
26 February 2007 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XX
20 February 2006 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XIX
28 February 2005 | San Jose, California, United States
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