Brian S. Ward
Modeling Group CAE at Synopsys Inc
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Logic, Optical lithography, Chromium, Photomasks, Optical proximity correction, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Model-based design

Proceedings Article | 29 March 2013
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: Atrial fibrillation, Manufacturing, Inspection, Printing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Model-based design

Proceedings Article | 5 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Manufacturing, Scanning electron microscopy, Photomasks, Optical proximity correction, Computer aided design, Critical dimension metrology, Semiconducting wafers, Electronic design automation

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Calibration, Optical proximity correction, Current controlled current source

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Diffractive optical elements, Data modeling, Calibration, Scanning electron microscopy, Data visualization, Optical proximity correction, Statistical modeling, Process modeling, Data analysis

Showing 5 of 16 publications
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