Bríd M. Connolly
Strategic Applications Manager at Toppan Photomasks Germany GmbH
SPIE Involvement:
Author
Publications (27)

Proceedings Article | 1 May 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Photomasks, Absorption, Reticles, Extreme ultraviolet lithography, Tantalum, Diffraction, Etching, Refractive index, Scanners, Distortion

Proceedings Article | 2 August 2018 Presentation + Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Extreme ultraviolet, Photomasks, Semiconducting wafers, Signal processing, Transmission electron microscopy, Atomic force microscopy, Etching

Proceedings Article | 9 November 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Polarization, Refractive index, Phase measurement, Near field, Absorption, Opacity, Silica, Photomasks, 193nm lithography, Semiconducting wafers, Diffraction, Phase shift keying, Critical dimension metrology, Airborne remote sensing, Finite-difference time-domain method, Panoramic photography, Binary data, Deep ultraviolet

Proceedings Article | 26 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Photomasks, Polarization, Semiconducting wafers, Imaging systems, Printing, Spatial frequencies, Airborne remote sensing, 3D modeling, Phase retrieval, Switches

Proceedings Article | 17 October 2014 Paper
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Deep ultraviolet, Reflectivity, Extreme ultraviolet, Photomasks, Reticles, Scanners, Aluminum, Extreme ultraviolet lithography, Atomic force microscopy, Semiconducting wafers

Showing 5 of 27 publications
Conference Committee Involvement (1)
33rd European Mask and Lithography Conference
26 June 2017 | Dresden, Germany
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