Dr. Britt Turkot
Intel Fellow at Intel
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 18 March 2016 Open Access Paper
Proceedings Volume 9776, 977602 (2016) https://doi.org/10.1117/12.2225014
KEYWORDS: Extreme ultraviolet, Reticles, Pellicles, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Optical lithography, Inspection, Yield improvement

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top