Dr. Britt Turkot
Fellow at
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Optical lithography, Scanners, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Yield improvement

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