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Brooks Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (2)
PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Polymers, Coating, Chemistry, Manufacturing, Inspection, Reflectivity, Control systems, Photoresist materials, Humidity, Statistical modeling
PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Sensors, Polymers, Ultraviolet radiation, Photoresist materials, Polymerization, Palladium, Manganese, Critical dimension metrology, Line edge roughness
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