Dr. Bruno La Fontaine
Sr. Director, EUV Lithography Applications at ASML San Jose
SPIE Involvement:
Fellow status | Conference Program Committee | Conference Chair | Conference Co-Chair | Author
Publications (73)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Light sources, Deep ultraviolet, Scanners, Hydrogen, Laser applications, Laser development, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | March 18, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Mirrors, Scanners, Reflectivity, Control systems, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Scanners, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma systems, Plasma, Tin

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Light sources, Metrology, Optical lithography, Laser development, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Plasma, Tin

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Multilayers, Light sources, Optical coatings, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Plasma, Tin

SPIE Journal Paper | June 29, 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

Showing 5 of 73 publications
Conference Committee Involvement (11)
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Showing 5 of 11 published special sections
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