Dr. Bruno La Fontaine
Sr. Scientist, Director CXRO at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (68)

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 904835 (2014) https://doi.org/10.1117/12.2048195
KEYWORDS: Plasma, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Tin, Light sources, Deep ultraviolet, Laser development, Hydrogen, Laser applications

Proceedings Article | 18 March 2014 Paper
Proceedings Volume 9048, 90480C (2014) https://doi.org/10.1117/12.2048184
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Control systems, Tin, Reflectivity, Mirrors, Pulsed laser operation, Laser scanners

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86792I (2013) https://doi.org/10.1117/12.2012695
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Tin, Plasma, Light sources, Carbon dioxide lasers, Neodymium, Optical lithography, Laser development, Metrology

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86790C (2013) https://doi.org/10.1117/12.2015492
KEYWORDS: Mirrors, Reflectivity, Multilayers, Extreme ultraviolet, Plasma, Extreme ultraviolet lithography, Optical coatings, Light sources, EUV optics, Tin

Proceedings Article | 1 April 2013 Paper
David Brandt, Igor Fomenkov, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christopher Wittak, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao, Kay Hoffmann, Tedsuja Ishikawa, David Evans, Spencer Rich
Proceedings Volume 8679, 86791G (2013) https://doi.org/10.1117/12.2011212
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Mirrors, Tin, Pulsed laser operation, Plasma systems, Laser scanners

Showing 5 of 68 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 25 March 2011

SPIE Conference Volume | 3 March 2010

SPIE Conference Volume | 17 March 2009

SPIE Conference Volume | 29 April 2008

Conference Committee Involvement (11)
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Showing 5 of 11 Conference Committees
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