Dr. Bruno La Fontaine
Sr. Director, EUV Lithography Applications at ASML Silicon Valley
SPIE Involvement:
Author
Publications (68)

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Light sources, Deep ultraviolet, Scanners, Hydrogen, Laser applications, Laser development, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Proceedings Article | 18 March 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Mirrors, Scanners, Reflectivity, Control systems, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Tin

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Multilayers, Light sources, Optical coatings, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Plasma, Tin

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Scanners, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma systems, Plasma, Tin

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Light sources, Metrology, Optical lithography, Laser development, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Plasma, Tin

Showing 5 of 68 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 25 March 2011

SPIE Conference Volume | 3 March 2010

SPIE Conference Volume | 17 March 2009

SPIE Conference Volume | 29 April 2008

Conference Committee Involvement (11)
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Showing 5 of 11 Conference Committees
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