Bryan W. Reese
Technical Specialist at
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Reticles, Contamination, Defect detection, Air contamination, Metals, Inspection, Wafer inspection, Photomasks, SRAF, Semiconducting wafers

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Reticles, Databases, Air contamination, Error analysis, Manufacturing, Inspection, Photomasks, Semiconducting wafers, Data analysis, Defect inspection

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Reticles, Databases, Air contamination, Error analysis, Manufacturing, Inspection, Photomasks, Semiconducting wafers, Data analysis, Defect inspection

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Databases, Air contamination, Error analysis, Manufacturing, Inspection, Photomasks, Semiconducting wafers, Data analysis, Defect inspection

Proceedings Article | 25 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Light sources, Reticles, Contamination, Optical spheres, Defect detection, Quartz, Manufacturing, Inspection, Photomasks, Computer aided design

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Reticles, Visualization, Metals, Inspection, Image transmission, Wafer inspection, Photomasks, Semiconducting wafers, Defect inspection

Showing 5 of 11 publications
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