Bryan Swain
at Tokyo Electron America Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Manufacturing, Control systems, Scatterometry, Time metrology, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Environmental sensing

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Metrology, Logic, Data modeling, Spectroscopy, Reflectivity, Scatterometry, Reflectometry, Reflectance spectroscopy, Critical dimension metrology

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Lithography, Scanners, Control systems, Scanning electron microscopy, Photoresist materials, Scatterometry, Process control, Logic devices, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Lithography, Metrology, Metals, Scanning electron microscopy, Scatterometry, Reflectometry, Process control, Aluminum, Critical dimension metrology, Semiconducting wafers

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top