Bumhwan Jeon
Senior Staff at TDK
SPIE Involvement:
Area of Expertise:
Optical Lithography , Process Integration , Failure Analysis
Publications (4)

Proceedings Article | 2 April 2014 Paper
Proceedings Volume 9050, 90501U (2014) https://doi.org/10.1117/12.2034206
KEYWORDS: Semiconducting wafers, Reticles, Calibration, Photomasks, Critical dimension metrology, Source mask optimization, Computational modeling, Optical lithography, Wavefronts, Overlay metrology

Proceedings Article | 18 April 2013 Paper
Proceedings Volume 8681, 868110 (2013) https://doi.org/10.1117/12.2010709
KEYWORDS: Semiconducting wafers, Optical alignment, Distortion, Overlay metrology, Annealing, Transistors, Logic, Laser processing, Lithography, Semiconductor manufacturing

Proceedings Article | 29 March 2013 Paper
Chien-Hsien Lee, Sohan Singh Mehta, Wontae Hwang, Hui Husan Tsai, Michael Anderson, Yayi Wei, Matthew Herrick, Xiang Hu, Bumhwan Jeon, Shyam Pal
Proceedings Volume 8682, 86820D (2013) https://doi.org/10.1117/12.2011843
KEYWORDS: Etching, Optical lithography, Reactive ion etching, Critical dimension metrology, Back end of line, Semiconducting wafers, Photomasks, Double patterning technology, Dielectrics, Metals

Proceedings Article | 29 March 2013 Paper
Proceedings Volume 8682, 86820O (2013) https://doi.org/10.1117/12.2012331
KEYWORDS: Diffusion, Critical dimension metrology, Polymers, Photoresist processing, Image processing, Manufacturing, Lithography, Optical lithography, Data modeling, Modulation

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