Bumhwan Jeon
Master
SPIE Involvement:
Author
Area of Expertise:
Optical Lithography , Process Integration , Failure Analysis
Publications (4)

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reticles, Optical lithography, Computational modeling, Calibration, Wavefronts, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 18 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Logic, Annealing, Laser processing, Distortion, Transistors, Semiconductor manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Optical lithography, Etching, Metals, Dielectrics, Photomasks, Double patterning technology, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Back end of line

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Optical lithography, Data modeling, Modulation, Polymers, Image processing, Diffusion, Manufacturing, Critical dimension metrology, Photoresist processing

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