Dr. Burak Baylav
RET Engineer at
SPIE Involvement:
Author
Area of Expertise:
Optical Proximity Correction , Photolithography , Microelectronics , Semiconductors , Semiconductor Manufacturing
Publications (4)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Diffraction, Optical filters, Phase shift keying, Image filtering, Photomasks, Extreme ultraviolet, Line width roughness, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Image processing, Image filtering, Photomasks, Nanoimprint lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Projection lithography

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Point spread functions, Data modeling, Calibration, 3D modeling, Fractal analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Model-based design

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Polymethylmethacrylate, Deep ultraviolet, Etching, Polymers, Resistance, Scanning electron microscopy, Photoresist materials, Absorbance, Photoresist developing

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