Dr. Burcin Erenturk
Principal Process Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Neodymium, Photoresist processing, Binary data

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Photovoltaics, Data modeling, Image processing, Printing, Photomasks, Source mask optimization, SRAF, Nanoimprint lithography, Binary data, Phase shifts

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