Dr. Burn Jeng Lin
Research Chair Professor at
SPIE Involvement:
Publications Committee | Fellow status | Symposium Committee | Symposium Chair | Conference Chair | Author | Editor | Instructor
Area of Expertise:
microlithography
Publications (124)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Electron beam lithography, Point spread functions, Backscatter, Scattering, Laser scattering, Feature extraction, Photomasks, Critical dimension metrology, Optimization (mathematics), Systems modeling

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Contamination, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Microelectromechanical systems, Electron beam lithography, Electron beams, Electrodes, Dielectrics, Coating, Reflectivity, Lens design, Atomic layer deposition, Structural design

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Data modeling, Backscatter, Scattering, Laser scattering, Monte Carlo methods, Photomasks, Critical dimension metrology

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Silica, Backscatter, Scattering, Diffusion, Laser scattering, Electroluminescence, Monte Carlo methods, Quantization, Raster graphics, Modulation transfer functions

SPIE Journal Paper | September 28, 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Semiconducting wafers, Scanners, Photomasks, Electrons, Extreme ultraviolet lithography, Extreme ultraviolet, Prototyping, Wafer-level optics, Electron beam lithography, Tolerancing

Showing 5 of 124 publications
Conference Committee Involvement (18)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
SPIE Advanced Lithography
27 February 2011 | San Jose, United States
Showing 5 of 18 published special sections
Course Instructor
SC113: Here Is Why in Dry/Immersion Optical Lithography
This short course intends to enrich the attendees' understanding of image formation physics through the lens and in the photoresist. They will learn the correct actions to take in improving the image. Optimizing operating conditions without the knowledge can result in a large number of test wafers, non-converging iterations, inconclusive experiments, waste of processing allocations, low yield, and long production delay.
SC577: Dry and Immersion Lithography for Non-Lithographers
This short course intends to enrich the attendees' understanding of lithography issues that they often encounter, help them design better chips, and develop better processes to make the chips meet better specs.
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