Dr. Byeong-Gyu Park Profile

Dr. Byeong-Gyu Park

at Pohang Accelerator Lab

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 9 April 2024 Poster + Paper

Sensitivity improvement of fluoroalkylated EUV resist with electron-rich vinyl units

Gayoung Kim, Yejin Ku, Jin-Kyun Lee, Jiho Kim, Byeong-Gyu Park, Sangsul Lee, Yu Ha Jang, Byung Jun Jung, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim

Proceedings Volume 12957, 129571X (2024) https://doi.org/10.1117/12.3010812

KEYWORDS: Extreme ultraviolet lithography, Electron beam lithography, Extreme ultraviolet, Lithography, Film thickness, Thin films, Photons, Solubility, Silicon, Semiconducting wafers, Fluorine

Read Abstract +

Proceedings Article | 9 April 2024 Presentation + Paper

Approach for enhancing sensitivity of tin-oxo cluster resist for high NA extreme UV lithography

Yejin Ku, Gayoung Kim, Min Seung Kim, Jin-Kyun Lee, Jiho Kim, Byeong-Gyu Park, Sangsul Lee, Seohyeon Lee, Byung Jun Jung, Changhyeon Lee, Hyunseok Kim, Su-Mi Hur, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim

Proceedings Volume 12957, 1295706 (2024) https://doi.org/10.1117/12.3010838

KEYWORDS: Extreme ultraviolet lithography, Solubility, Electron beam lithography, Thin films, Extreme ultraviolet, Lithography

Read Abstract +

Proceedings Article | 1 May 2023 Presentation + Paper

Fluoroalkylated tin-oxo nano clusters as resist candidates for extreme UV lithography

Yejin Ku, Hyungju Ahn, Jin-Kyun Lee, Jiho Kim, Byeong-Gyu Park, Sangsul Lee, Yu Ha Jang, Byung Jun Jung, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim

Proceedings Volume 12498, 1249816 (2023) https://doi.org/10.1117/12.2658210

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Polymers, Extreme ultraviolet, Thin films, Lithography, Tin

Read Abstract +

Proceedings Article | 1 May 2023 Poster + Paper

Use of highly EUV absorbing element in chemically amplified resist

Yejin Ku, Han Bit Park, Gayoung Kim, Jin-kyun Lee, Jong-Won Lee, Byeong-Gyu Park, Sangsul Lee

Proceedings Volume 12498, 124981N (2023) https://doi.org/10.1117/12.2657982

KEYWORDS: Chemical elements, Extreme ultraviolet lithography, Molecules, Extreme ultraviolet, Copolymers, Solubility, Photoacid generators, Iodine, Photoresist materials, Film thickness

Read Abstract +

Proceedings Article | 25 May 2022 Presentation + Paper

Perfluoroalkylated metallophthalocyanines as EUV resist candidates

Yejin Ku, Jun-il Kim, Hyun-Taek Oh, Youngtae Kim, Minkyu Choi, Jin-Kyun Lee, Kang-Hyun Kim, Byeong-Gyu Park, Sangsul Lee, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim

Proceedings Volume 12055, 120550D (2022) https://doi.org/10.1117/12.2612313

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Electron beam lithography, Zinc, Lithography, Thin films, Metals

Read Abstract +

Proceedings Article | 22 February 2021 Presentation + Paper

Highly fluorinated alternating copolymers possessing high glass transition temperature and cross-linking capabilities under extreme UV radiation

Ye-Jin Ku, Hyun-Taek Oh, Kanghyun Kim, Byeong-Gyu Park, Sangsul Lee, Jin-Kyun Lee

Proceedings Volume 11612, 116120J (2021) https://doi.org/10.1117/12.2582948

KEYWORDS: Polymers, Glasses, Extreme ultraviolet lithography, Extreme ultraviolet, Ultraviolet radiation, Thin films, Polymerization, Chemistry, Semiconductors, Photoresist materials

Read Abstract +

Proceedings Article | 23 March 2020 Paper

Molecular resists equipped with fluorinated aromatic units for electron-beam and extreme UV lithography

Hyun-Taek Oh, Kanghyun Kim, Byeon-Gyu Park, Sangsul Lee, Jin-Kyun Lee

Proceedings Volume 11326, 113260B (2020) https://doi.org/10.1117/12.2551833

KEYWORDS: Fluorine, Extreme ultraviolet lithography, Electron beam lithography, Extreme ultraviolet, Polymers, Lithography, Thin films, Photons

Read Abstract +

Showing 5 of 7 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years