Byoung-Sub Nam
at SK Hynix Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Manufacturing, Computer simulations, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Semiconductors, Lithography, Optical lithography, Calibration, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, Photoresist processing, Process modeling

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Image processing, Electroluminescence, Scanning electron microscopy, Photomasks, Double patterning technology, Mask making, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 11 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Point spread functions, Calibration, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Wafer testing

Proceedings Article | 20 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Silicon, Light scattering, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Wafer testing

Showing 5 of 11 publications
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