Dr. Byongseog Lee
at SK Hynix Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical parametric oscillators, Optical lithography, Scanners, Particles, Error analysis, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Semiconducting wafers, Overlay metrology, EUV optics

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Target detection, Lithography, Metrology, Sensors, Etching, Quality measurement, Image quality, Signal processing, Semiconducting wafers, Overlay metrology

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Metrology, Quality measurement, Scatterometry, Uncertainty analysis, Signal processing, Process control, Photomasks, Double patterning technology, Overlay metrology

Proceedings Article | 17 March 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Capacitors, Etching, Polymers, Molecules, Dielectrics, Ions, Scanning electron microscopy, Capacitance, Wet etching, Yield improvement

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Oxides, Ions, Silicon, Gases, Diffusion, Photoresist materials, Silicon films, Chemical reactions, Semiconducting wafers, Photoresist developing

Showing 5 of 9 publications
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