Byung Gook Kim
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Area of Expertise:
Photomask technology , Electron beam lithography , EUV mask
Publications (48)

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Databases, Inspection, Data processing, Photomasks

Proceedings Article | 17 November 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Etching, Argon, Dry etching, Chromium, Emission spectroscopy, Photomasks, Plasma etching, Critical dimension metrology, Chlorine, Plasma

Proceedings Article | 20 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Air contamination, Scanners, Ions, Silicon, Transmission electron microscopy, Pellicles, Photomasks, Wet etching, Critical dimension metrology, Molybdenum

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Thermography, Thin films, Lithography, Graphene, Crystals, Silicon, Hydrogen, Infrared lasers, Pellicles, Silicon films, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Carbon, Particles, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Ruthenium, Mask cleaning, Industrial chemicals

Proceedings Article | 28 July 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Semiconductors, Lithography, Metrology, Error analysis, Reliability, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing

Showing 5 of 48 publications
Conference Committee Involvement (8)
Photomask Technology
15 September 2019 | Monterey, California, United States
Photomask Technology
17 September 2018 | Monterey, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Photomask Technology
12 September 2016 | San Jose, California, United States
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Showing 5 of 8 published special sections
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