Dr. Byung-Ho M. Nam
Professor at Yeungnam Univ
SPIE Involvement:
Publications (24)

Proceedings Article | 29 October 2014 Paper
Proceedings Volume 9235, 92351R (2014) https://doi.org/10.1117/12.2066283
KEYWORDS: Photomasks, Transmittance, Semiconducting wafers, Nanoimprint lithography, Lithography, Binary data, Chromium, Etching, Image analysis, Extreme ultraviolet

Proceedings Article | 20 March 2009 Paper
Proceedings Volume 7271, 727144 (2009) https://doi.org/10.1117/12.814364
KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Photomasks, Scanning electron microscopy, Wafer testing, Silicon, Light scattering

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72711G (2009) https://doi.org/10.1117/12.814407
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Scanners, Critical dimension metrology, Extreme ultraviolet, Silicon, Optical lithography, Deep ultraviolet, Semiconducting wafers, Laser scanners

Proceedings Article | 18 March 2009 Paper
Tae-Seung Eom, Sarohan Park, Jun-Taek Park, Chang-Moon Lim, Sunyoung Koo, Yoon-Suk Hyun, HyeongSoo Kim, Byung-Ho Nam, Chang-Reol Kim, Seung-Chan Moon, Noh-Jung Kwak, Sungki Park
Proceedings Volume 7271, 727115 (2009) https://doi.org/10.1117/12.814378
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Double patterning technology, Lithography, Etching, Critical dimension metrology, Scanners, Immersion lithography

Proceedings Article | 19 March 2008 Paper
Byoung-Sub Nam, James Moon, Joo-Hong Jung, Dong-Ho Kong, Se-young Oh, Cheol-Kyun Kim, Byung-Ho Nam, Dong Gyu Yim
Proceedings Volume 6925, 692514 (2008) https://doi.org/10.1117/12.772430
KEYWORDS: Photomasks, Design for manufacturing, Optical proximity correction, Semiconductors, Copper, Semiconducting wafers, Data modeling, Lithographic illumination, Electroluminescence, Optical lithography

Showing 5 of 24 publications
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