Dr. Byung-Ho M. Nam
Senior Manager at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (24)

PROCEEDINGS ARTICLE | October 29, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Etching, Chromium, Image analysis, Transmittance, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | March 20, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Silicon, Light scattering, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Wafer testing

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Optical lithography, Etching, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Optical lithography, Deep ultraviolet, Scanners, Silicon, Laser scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Semiconductors, Optical lithography, Lithographic illumination, Data modeling, Copper, Electroluminescence, Design for manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Semiconductors, Lithography, Laser applications, Chromium, Electroluminescence, Scanning electron microscopy, Photomasks, Bismuth, Semiconducting wafers, Binary data

Showing 5 of 24 publications
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